Abstract
The radical copolymerization of 2-chloromethyl-1-(p-vinyl phenyl)cyclopropane (CMCP) with glycidyl methacrylate (GMA) has been carried out. The composition and structure of the obtained copolymer have been established. The constant values of relative activity of monomers have been determined and Q-e parameters on Alfrey-Price have been calculated. The photosensitivity of new cyclopropane and epoxy-containing photosensitive copolymers has been studied. The photochemical structuring has been investigated and it has been established that the synthesized polymer has photosensitivity (56 cm2/J) and can be used for the creation of photosensitive material.
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