Abstract
New photoreactive homo- and copolymers containing pendant chlorocinnamoyl moieties were respectively synthesized by homopolymerization of corresponding acrylic monomer and copolymerization with glycidyl methacrylate. The diverse structures were characterized by different spectroscopic techniques. The thermal properties of the photosensitive polymers were investigated by thermogravimetric analysis in air and differential scanning calorimetry under nitrogen atmosphere. The compositions of polymers were determined by 1H-NMR analysis. The reactivity ratios of both comonomers were calculated using the conventional linearization methods such as Fineman–Ross, Kelen–Tudos, extended Kelen–Tudos and a non-linear error-in-variables model (EVM) method using a computer program, RREVM, in order to optimize the reaction conditions for industrial applications. The photoreactivity of newly synthesized homo- and copolymers containing pendant chlorocinnamoyl moieties was investigated in solution as well as in thin films. The effects of solvent nature, concentration, temperature, copolymer compositions and photosensitizers on the rate of photocrosslinking of these new photoresponsive polymers were evaluated. Suitable conditions were discussed for using as negative photoresists in industries.
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