Photocrosslinkable copolymers based on 4‐acryloyloxyphenyl‐3′‐chlorostyryl ketone and methyl methacrylate: synthesis, comonomer reactivity ratios and UV photosensitivity

Abstract

AbstractA new photosensitive acrylate monomer having a pendant chlorocinnamoyl moiety (APCSK) was copolymerized with methyl methacrylate (MMA) in different feed compositions in ethyl acetate solution at 70°C using benzoyl peroxide as a free‐radical initiator. The newly synthesized copolymers were characterized by FTIR, 1H and 13C nuclear magnetic resonance (NMR) spectral techniques, as well as by size‐exclusion chromatography. Their thermal behaviour was assessed by thermogravimetric analysis in air and differential scanning calorimetry under nitrogen atmosphere. The copolymers exhibit no phase separation since there is only one glass transition temperature (Tg) value in the region of copolymer composition studied. The reactivity ratios of the comonomers were calculated by adopting linearization methods such as the Fineman–Ross (F‐R), Kelen–Tudos (K‐T) and extended Kelen–Tudos (ExtK‐T) methods, and by a non‐linear error‐in‐variables model method (EVM) using a computer program (RREVM). The results suggest that MMA is more reactive than APCSK and that their copolymerization leads to the formation of random copolymers. The photosensitivity of the copolymer samples was studied in solution as well as in thin films through UV irradiation. The influence of different factors, including solvent nature, concentration, temperature, photosensitizer and copolymer composition, on the rate of photocrosslinking of the photoreactive copolymers was investigated for effective industrial application of these polymers as negative photoresists. Copyright © 2004 Society of Chemical Industry