Abstract
TiO 2/SiO 2 composite thin films deposited on various substrates have been prepared by radio frequency magnetron sputtering from a composite target. The composite films were characterized by X-ray diffraction (XRD), atomic force microscopy, X-ray photoelectron spectroscopy and water contact angel measurements. XRD analysis indicates the amorphous structures of TiO 2/SiO 2 composite thin films. Contact angle results show that TiO 2/SiO 2 composite thin films represent natural superhydrophilicity without UV irradiation due to the enhanced acidity at SiO 2–TiO 2 interfaces. The heat treatment is necessary to promote thermal diffusion of Si 4+ or Ti 4+ cations within TiO 2 or SiO 2 hosts. In addition, radio frequency magnetron sputtering also may play a role in the formation of hydrophilic film surfaces.
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