Abstract
An anodic porous alumina with precisely controlled size and depth of holes was prepared and used for nanoimprinting of a polymer. As a typical application of nanoimprinting, antireflection (AR) structures of polymer were prepared. The obtained AR structure with optimized geometrical structures exhibited a low reflectance of less than 0.2 %. The present process allows the high throughput production of polymer AR structures with large sizes.
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