Abstract
The optimization of antireflection (AR) structures of polymer composed of an ordered array of tapered pillars was studied. An anodic porous alumina mold with precisely controlled tapered holes was prepared and used for photoimprinting of the polymer. The reflectance of the obtained AR polymer structures with conical pillars was evaluated through the measurement of transmittance. Among the AR structures with pillars with various slopes, those with a gradually changing slope exhibited the lowest reflectance. The fabrication process will be effective for the formation of an AR surface with minimized reflectance over a large sample area.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
More From: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.