Abstract
Polysiloxane antireflective structures composed of tapered nanopillar arrays were prepared by nanoimprinting using anodic porous alumina molds with tapered pores. Because polysiloxane is a heat-resistant material, the resulting tapered nanopillar array structures were maintained even after heat treatment at 200 °C. In addition, no significant changes in antireflection properties were observed before and after heat treatment at 200 °C. These results indicate that the polysiloxane nanopillar arrays obtained in this study can be applied as heat-resistance antireflection structures.
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