Abstract
Silica nanoparticles (40 nm) were individually and conformally coated with alumina films using atomic layer deposition (ALD) in a fluidized bed reactor. Films were deposited using self-limiting sequential surface reactions of trimethylaluminum and water. Alumina vibrational modes were observed using Fourier-transform infrared spectroscopy (FTIR). X-ray photoelectron spectroscopy (XPS) indicated complete coverage on the surface as the silica features were completely attenuated. Scanning electron microscopy (SEM) and energy dispersive spectroscopy (EDS) showed high uniformity of the deposited films. Transmission electron microscopy (TEM) revealed extremely conformal films with an average growth rate of 0.11 nm per cycle. Self-limiting characteristics of ALD allowed primary nanoparticles to be coated as they fluidized as dynamic aggregates.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
