Nanocluster ion source by plasma-gas aggregation

Abstract

We are constructing and developing a new type cluster ion source and a detection system. The new cluster ion source consists of a large area plasma source and gas aggregation cell instead of present cluster ion source configuration (magnetron ion source and gas aggregation cell). In new type cluster ion source we adopted a pulsed high-power microwave type plasma source for production of ions and neutral particles. This source can produce dense and stable plasma independent of shape or properties of the sample, and additionally it can produce large sizes of plasma, so that whole area of the sample is sputtered. This feature allows us to produce an intense beam of cluster ions stably compared to the present ion source.