Abstract
A unique nanoscale ring-shape pattern of fluorocarbon macromolecules grown duringSiO2 reactive ion etching (RIE) is presented. This pattern was discovered afterSiO2 RIE usingtrifluoromethane (CHF3) and oxygen. Typical dimensions of the ring-type fluorocarbon structure are found to be ∼ 50 nm in diameter, ∼ 10 nm in wallthickness, and ∼ 50 nm in height in this study. The ring-shape structure grows towards a tube-shape structureup to 500 nm. Morphological studies are also presented with various plasma etchingparameters. This experiment shows that oxygen-rich RIE etching produces more ring-typestructures. This could be used as a nanoscale template for other applications.
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