Abstract
A representation method for line edge roughness (LER) parameters based on wavelet-analysis is proposed. Multi-resolution analysis is processed on both spatial features and frequency features of line edge. Different feature details are achieved with different analysis resolution. The features of line edge are able to be represented well by wavelet analysis. And an extraction method for contour line of LER is designed based on wavelet baseline. The experimental results show that more details of LER features are obtained by multi-resolution wavelet analysis. The method is feasible to estimate the nano-scale LER. Therefore, it is possible to reduce the processing errors of nano-scale manufacturing line.
Sign-in/Register to access full text options 
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
