Abstract
The copy of structures in the same tone as the original asks at least for a double replication. Each replication generation will suffer from shrinkage of the replication material used, due to curing or thermal contraction. The impact of shrinkage is addressed in a basic study by simulation and experiment. The main replication materials investigated are OrmoStamp and SU-8. Presently, the preparation of anisotropic adhesion elements with hierarchical structures is investigated. The structures are micrometer-sized isolated pads with nanometer-sized self-aligned ripples (laser-induced periodic surface structures) on top. The initial structures are available as isolated photoresist patterns on Si. The double replication of this polymeric master raises questions with respect to its chemical and mechanical stability. The authors report an optimized replication process with an OrmoStamp intermediate template and a final replication in an elastomer. The anisotropic character of the so prepared hierarchical elastomeric adhesion elements is demonstrated by measurement.
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