Abstract
Multilayers are structures in which two (or more) materials are alternately deposited, giving a periodicity which causes the sample to act as a Bragg diffractor. Recent developments in thin film technology have made possible the construction of such layered synthetic microstructures in the range of layer thicknesses of 10 Å or so. They would serve as valuable experimental tools in many areas of X-ray and extreme UV instrumentation. We present here a few micrographs obtained by transmission electron microscopy of the layered synthetic microstructure cross section. The sample studied was produced by r.f. diode sputtering and was composed of 17 layers of tungsten (120 Å) and carbon (200 Å) arranged alternately.
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