Abstract
Recent developments in thin film technology have made it possible to construct multilayered thin film structures that act as efficient Bragg diffractors for x‐rays and extreme ultraviolet (EUV) radiation (see papers by Barbee and by Spiller, these proceedings). These structures, analogous to multilayered interference filters for the visible region of the spectrum, have important potential applications in many areas of x‐ray/EUV instrumentation. In this paper the theory of x‐ray diffraction by multilayer structures is briefly outlined, and approximate formulae for estimating their performance presented. A more complete computation scheme based on an ‘‘optical’’ model of multilayers is described, an it is shown how this approach can be modified to take account of imperfections in the structure and to compute the properties of nonperiodic structure. Finally, a comparison with some experimental results is presented.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
