Abstract

Transmission diffraction gratings operating at 1,565 nm based on multilayer porous silicon films are modeled, fabricated, and tested. Features down to 2 μm have been patterned into submicron-thick mesoporous films using standard photolithographic and dry etching techniques. After patterning of the top porous film, a second anodization can be performed, allowing an under-layer of highly uniform porosity and thickness to be achieved. High transmission greater than 40% is measured, and modeling results suggest that a change in diffraction efficiency of 1 dB for a 1% change in normalized refractive index can be achieved. Preliminary measurement of solvent vapor shows a large signal change from the grating sensor in agreement with models.

Highlights

  • Diffraction gratings built from porous silicon (PS) have enormous potential to produce highly sensitive and rapid detection of analytes [1]

  • Planar gratings respond to changes in the near surface refractive index, requiring only shallow analyte infiltration compared with PS sensors made from microcavities and multilayer film stacks

  • Since the conductivity of the HF is significantly greater than the carrier depleted, high porosity P1 layer shown in Figure 3, the potential at the Si-electrolyte surface is unaffected by the P1 layer

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Summary

Introduction

Diffraction gratings built from porous silicon (PS) have enormous potential to produce highly sensitive and rapid detection of analytes [1]. PS-based grating sensors have previously been made using pre-etched silicon [2], direct laser writing [3,4], imprinting [5,6], and holography [7]. Optical layers have been fabricated under the grating either as an uncontrolled result of the fabrication process [2,5] or by design [4,6]. Such layers could allow complex structures such as 2D photonic crystal structures to be created [6]; high-

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