Abstract
The morphology and chemical bonding of the nucleation surface of polycrystalline diamond films were studied following the removal of the silicon substrate by acid etching and mild plasma cleaning. Atomic force microscopy characterization of this surface revealed a mosaic structure of cracks arranged in hexagonal patterns. These cracks are correlated with etched twin grain boundaries that surrounded hexagonal diamond crystals at the initial growth stages of the diamond films. High resolution electron energy loss spectroscopy studies indicate that mild annealing of the diamond film caused desorption of various oxides exposing a damaged diamond surface.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
