Abstract
The morphology and chemical bonding of the nucleation surface of polycrystalline diamond films were studied following the removal of the silicon substrate by acid etching and mild plasma cleaning. Atomic force microscopy characterization of this surface revealed a mosaic structure of cracks arranged in hexagonal patterns. These cracks are correlated with etched twin grain boundaries that surrounded hexagonal diamond crystals at the initial growth stages of the diamond films. High resolution electron energy loss spectroscopy studies indicate that mild annealing of the diamond film caused desorption of various oxides exposing a damaged diamond surface.
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