Abstract
Depending on the X-ray energy, the structure of an X-ray waveguide needs to be varied for greater efficiency. Therefore, a Si/PMMA(polymethyl methacrylate)/Si thin-film structure, whose top Si layer was steplike, was designed as a planar X-ray waveguide on the basis of calculations, and it was fabricated by spin-coating and sputtering. By irradiating white X-rays on two selected areas of a stepped waveguide, the top-layer thicknesses of which were different, W Lβ and Mo Kα lines were effectively guided and monochromatized.
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