Abstract
Roller-type nanoimprint lithography(NIL) is an emerging large-area nanopatterning method with high throughput, low cost and high resolution. It has been considered as a promising candidate for extremely low-cost mass production of micro/nanostructures and become the most potential manufacturing method for industrialization of nanoimprinting technology. The rolled mold deformation of roller-type NIL is investigated. Two theoretical models are proposed. Furthermore, the mechanism and influence factors of the roller mold deformation are revealed by theoretical analyses and numerical simulations. Some significant conclusions have been achieved. These findings are valuable in reducing mold deformation, optimizing imprinting process conditions, and enhancing the quality of imprinted patterns as well as further improving throughput.
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