Abstract
UV-nanoimprint lithography (UV-NIL) using a soft mold is a promising technique with low cost and high throughput for producing the submicron scale large-area patterns. However, the deformations of the soft mold during imprinting process which can cause serious consequences have to be understood for the practical application of the process. This paper investigated the deformation of the soft mold by theoretical analyses, numerical simulations, and experimental studies. We simulated the mold deformation using a simplified model and finite element method. The simulation and the related experimental results agree well with each other. Through the investigation, the mechanism and affected factors of the mold deformation are revealed, and some useful conclusions have been achieved. These results will be valuable in optimizing the imprinting process conditions and mold design for improving the quality of transferred patterns.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.