Abstract
Assuming a parabolic rate profile, the temperature field in a reactor for low-pressure chemical vapour deposition is investigated by a numerical solution of the differential equation of convection heat transfer. It is found that the length of the tube in which the gas is heated, is a function of the gas flow rate and its thermophysical characteristics. For a number of gas components this length changes in the range of 10–14 cm from the beginning of the temperature plateau of the reactor. The analysis carried out by means of the model shows a good agreement between the predicted and experimentally fixed distances for positioning the wafer holder.
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