Abstract
The discrete sources method (DSM) is extended to investi- gate complete mathematical models for light scattering from various kinds of silicon wafers features. Computer simulations demonstrate the usefulness of the DSM for comparing scatter signals associated with different surface features. Wafer features such as contaminating par- ticles, subsurface defects and pits are investigated. © 1999 Society of Photo- Optical Instrumentation Engineers. (S0091-3286(99)00908-3)
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