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Abstract
In this paper, a study based on the mathematical modelling, applying different process simulation tools (CASINO, TREM, SELID) for characterization of PMMA resist and for the improvement of the resolution concerning the critical dimensions of nano-patterning by electron beam lithography (EBL) is presented. Data for important EBL characteristics (energy deposition function, proximity effect parameters, solubility rate, etc.) are obtained by applying different approaches (Monte Carlo methods, regression models, etc.).
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