Modeling and comparative analysis of DC characteristics of AlGaN/GaN HEMT and MOSHEMT devices

Abstract

AbstractIn this paper, a charge control model is developed for AlGaN/GaN High Electron Mobility Transistor (HEMT) and Metal Oxide Semiconductor High Electron Mobility Transistor (MOSHEMT) by considering the triangular potential well in the two‐dimensional electron gas (2DEG) and simulated with matlab. The obtained results from the developed model are compared with the experimental data for drain current, transconductance, gate capacitance and threshold voltage of both devices. The physics‐based models for 2DEG charge density, threshold voltage and gate capacitance have been developed. By using these developed models, the drain current for both linear and saturation modes is derived. The predicted threshold voltage with the variation of barrier thickness has been plotted. A positive threshold voltage can be obtained by decreasing the barrier thickness that builds up the foundation for enhancement mode MOSHEMTs. The predicted C‐V, Id‐Vgs, Id‐Vds and transconductance characteristics show an excellent agreement with the experimental results from the literature and hence validate the developed model. The results clearly establish the potential of using AlGaN/GaN MOSHEMT approach for high power microwave and switching applications. Copyright © 2015 John Wiley & Sons, Ltd.