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Abstract
CrN thin films with an N/Cr ratio of 95% were deposited by reactive magnetron sputtering onto (0 0 0 1) sapphire substrates. X-ray diffraction and pole figure texture analysis show CrN (1 1 1) epitaxial growth in a twin domain fashion. By changing the nitrogen versus argon gas flow mixture and the deposition temperature, thin films with different surface morphologies ranging from grainy rough textures to flat and smooth films were prepared. These parameters can also affect the CrNx system, with the film compound changing between semiconducting CrN and metallic Cr2N through the regulation of the nitrogen content of the gas flow and the deposition temperature at a constant deposition pressure. Thermoelectric measurements (electrical resistivity and Seebeck coefficient), scanning electron microscopy, and transmission electron microscopy imaging confirm the changing electrical resistivity between 0.75 and 300 , the changing Seebeck coefficient values between 140 and 230 , and the differences in surface morphology and microstructure as higher temperatures result in lower electrical resistivity while gas flow mixtures with higher nitrogen content result in single phase cubic CrN.
Highlights
Introduction usChromium nitride (CrN) is a hard and corrosion resistant compound that has gained interest for various applications such as medical implants,[1] silver luster decorative coatings,[2] and wearan resistant coatings for cutting tools especially when hot corrosion resistance is needed.[3,4]Chromium nitride is an interstitial compound, in which nitrogen atoms reside in the octahedral spaces between the chromium atoms in an fcc lattice, making the compound susceptible to stoichiometry deficiency
In an initial study of deposition temperature, we observed that low temperature deposition at 550 °C or lower will lead to the formation of cri pt polycrystalline films with high electrical resistivity, while deposition temperatures higher than
It is well known that higher deposition temperatures lead to enhanced adatom mobility and grain boundary diffusion resulting in grain coalescence and coarsening.[51]
Summary
Introduction usChromium nitride (CrN) is a hard and corrosion resistant compound that has gained interest for various applications such as medical implants,[1] silver luster decorative coatings,[2] and wearan resistant coatings for cutting tools especially when hot corrosion resistance is needed.[3,4]Chromium nitride is an interstitial compound, in which nitrogen atoms reside in the octahedral spaces between the chromium atoms in an fcc lattice (i.e., rock-salt cubic), making the compound susceptible to stoichiometry deficiency. There is a second interstitial compound, hexagonal Cr2N, which can be formed in CrN films as a secondary phase.[5,6] In addition to the more traditional applications and properties of CrN, studies on the thermoelectric properties have shown that CrN has a moderate electrical resistivity, low thermal conductivity, and high. Quintela et al.[7] reported on 1:1 stoichiometric CrN thin films, pte showing a Seebeck coefficient of approximately -120 μVK −1 and a dimensionless figure of merit (zT) of 0.12 at room temperature (compared to 0.1 for PbTe:Tl). Kerdsongpanya et al.[8] reported a Seebeck coefficient of -230 μVK −1 and a power factor of 1.7 × 10-3 Wm−1 K −2 near 400 °C for CrN thin films deposited on sapphire by magnetron sputtering. The high electrical resistivity of CrN stems from the localized 3d orbitals which give the electrons large effective masses and
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