Abstract
The microstructure and magnetic properties of FeSiAl(Ti/Ta)(O)N films prepared by rf magnetron reactive sputtering were studied. The microstructure was controlled by changing the N2 gas flow rate ratio [η=N2/(Ar+N2)] in the sputtering gas. The soft magnetic properties were observed after thermal treatment at around η of 2% and η of 20%, where the saturation magnetostrictions and the intrinsic stresses took small values. The film with η of 20% had a granular structure as mostly observed on nanocrystalline materials. On the other hand, the film prepared with η of 2% had the structure which consisted of needle shaped grains or dendritic grains. The composition of the granular grains and needle shaped grains were mainly Fe and FeSi, respectively. The film with η of 2% exhibited Bs of 1.3 T, permeability of 3000–8000 at 1 MHz, respectively, and realized a high corrosion resistance. The soft magnetic properties of the films with needle shaped grains are explained by two-dimensional random anisotropy effect.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
