Abstract
The soft magnetic, microstructural, and magnetostrictive properties of Fe81Ga19 (FeGa) film sputter deposited onto 2.5-nm Ta, Cu, and Ni80Fe20 (NiFe) underlayers were investigated. The films deposited with an underlayer showed increased in-plane uniaxial anisotropy and a decrease in in-plane coercivity. The smallest coercivity was observed in FeGa deposited with a NiFe underlayer at 15 Oe, compared to 84 Oe for films deposited directly on Si. In addition, an effective Gilbert damping coefficient (αeff) as low as 0.044 was achieved for a 100-nm FeGa film with a NiFe underlayer. The coercivity and αeff were shown to decrease further as a function of FeGa film thickness. The FeGa films were also able to retain or increase their saturation magnetostriction when deposited on an underlayer. This enhancement is attributable to the impact of the underlayer to promote an increased (110) film texture and smaller grain size, which is correlated to the lattice match of the underlayer of the sputtered FeGa film. Among the underlayers studied, NiFe promoted the best enhancement in the soft magnetic properties for FeGa thin films, making it an attractive material for both strain-mediated magnetoelectric and microwave device applications.
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