Abstract
The microstructure, morphology, and magnetic properties of FeAlN films deposited by reactive rf magnetron sputtering with subsequent treatment by three techniques, namely, in situ, ex situ (with the sputtering and annealing processes separated), and thermal crystallization of amorphous alloys, have been studied. FeAlN films prepared by the ex situ technique exhibit the best soft magnetic characteristics. Thermal crystallization of amorphous alloys produced films with properties having the highest thermal stability. Films 800-to 1000-nm thick were found to have the best soft magnetic properties. The dependences of the properties of FeAlN films on nitrogen content and annealing temperature were established. The conditions favoring the preparation of thin nanostructured FeAlN films featuring the best soft magnetic characteristics (saturation induction BS = 1.8 T, coercivity HC = 1.2 Oe, magnetic susceptibility μ1 (1 MHz) = 3400) were determined.
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