Microstructural characterization of BN thin films using RF magnetron sputtering method

Abstract

Boron nitride films were prepared via radio frequency (RF) magnetron sputtering from a hexagonal boron nitride (h-BN) target on 316L stainless steel substrates. Deposition process was carried out in a three different Ar and N2 mixture environment regimes. The composition and microstructure morphology of the BN films at varied mixing ratio of Ar and N2 plasma were investigated by XRD (X-Ray Diffraction) and Scanning Electron Microscopy (SEM) techniques respectively. Phase identification of c-BN was done with Fourier transform infrared spectroscopy (FTIR). The objective of the study was to investigate the effects of varying the ratio of N2 gas on the structural morphology and the formation of c-BN phase was studied. Using QAr/QN2 –5/1 ratio an improved microstructure quality and more c-BN phase formation suggesting a fundamental strategy for achieving high-quality c-BN films. The thickness of the coating was measured by calottes.