Microsphere photolithography using reusable microsphere array mask for low-cost infrared metasurface fabrication

Abstract

Microsphere photolithography (MPL) is an alternative low-cost technique for the large-scale fabrication of periodic structures, such as metasurfaces. This technique utilizes the photonic nanojet generated in the photoresist (PR), by microspheres in near proximity, which are exposed to collimated ultraviolet (UV) flood illumination. In the basic approach, a microsphere array is self-assembled on, or transferred to, the substrate prior to exposure. After exposure, the microspheres are washed away in the development step. The process to recover and clean these microspheres for reuse is complicated. This paper investigates the use of reusable microsphere masks created by fixing the microspheres on a UV transparent support. This is then brought into contact with the photoresist with controlled pressure. There is a trade-off between the quality of the fabricated samples and the wear of the mask determined by the contact pressure. The system is demonstrated using a digital micromirror device (DMD)-based direct-write exposure system to fabricate infrared (IR) metasurfaces. These metasurfaces are characterized and compared to simulation models. Finally, a series of 50 hierarchically patterned IR metasurfaces was fabricated using a single reusable mask. These samples had a <3% coefficient of variance when viewed with a thermal camera. This work shows the potential of mask-based MPL and other contact microlens array-based photolithography techniques for low-cost large-scale fabrication.