Microscopic Patterning on the Polysilane Films by the Laser Induced Grating Technique

Abstract

Microscopic patterning on polysilane thin film was observed after photoexcitation with an optical interference pattern using a nanosecond pulsed laser. The patterning processes were monitored by the diffraction of the probe beam. The observed diffraction signals consist of the transient grating component due to the temperature change and the permanent grating component due to a chemical reaction. It was found that the microscopic pattern was destroyed with prolonged laser radiation. The created microscopic pattern was observed by the optical microscope.