Abstract
An etch release process capable of releasing long resonant gate transistor bridges from a sacrificial layer has been studied as a step towards developing a system to mimic the cochlear mechanism inside the human ear. The developed etch release process involves the use of a gentle etch tool that is capable of a clean and damage-free etch release. The influence of temperature and oxygen/nitrogen gas flow rates on the undercut etch rates and the profiles of photoresist and polyimide sacrificial layers have been investigated. An array of aluminum bridges of length 0.278–1.618 mm, which cover the frequencies from 1 to 33.86 kHz, has been designed and released from a sacrificial layer. The resonating beams have been measured.
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Schedule a callMore From: Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
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