Abstract
Plasma produced from molten-tin microdroplets generates extreme ultraviolet light for state-of-the-art nanolithography. Currently, CO2 lasers are used to drive the plasma. In the future, solid-state mid-infrared lasers may instead be used to efficiently pump the plasma. Such laser systems have promise to be more compact, better scalable, and have higher wall-plug efficiency. In this Topical Review, we present recent findings made at the Advanced Research Center for Nanolithography (ARCNL) on using 1 and 2 µm wavelength solid-state lasers for tin target preparation and for driving hot and dense plasma. The ARCNL research ranges from advanced laser development, studies of fluid dynamic response of droplets to impact, radiation-hydrodynamics calculations of, e.g. ion ‘debris’, (EUV) spectroscopic studies of tin laser-produced-plasma as well as high-conversion efficiency operation of 2 µm wavelength driven plasma.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
