Abstract
Polycrystalline thin films of Al, Fe and Ni have been implanted with CH 4 + ions, and investigated by high voltage transmission electron microscopy (HVTEM) and selected area diffraction (SAD). It has been demonstrated that good quality glassy films of Al, uniformly amorphous over the entire implanted area, can be formed by graded implantation of CH 4 + ions with the dose ranging between 8 × 10 17−1 × 10 18 ions/cm 2. In the case of Fe and Ni, however, only partial transformation into the amorphous phase occurred. The stability of the glassy phases has been tested by annealing studies.
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