Abstract
Chromium films have been deposited on magnesium by metal plasma immersion ion implantation and deposition. With this method an intermixed layer can be produced by ion implantation before film deposition. The most suitable process parameters for implantation have been determined. The plasma is produced by a cathodic arc discharge operated in direct current mode and filtered by means of a curved magnetic filter. The maximum total ion current available at the filter exit is about 1.45% of the arc current for chromium. This corresponds to a filter transmission of about 24%. The dependence of the particle content of the films on the substrate position has been investigated. The corrosion behavior of the coated magnesium is improved greatly by reducing the particle content of the film as well as by the formation of an intermixed layer.
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