Energetic deposition using filtered cathodic arc plasmas

Abstract

Energetic film deposition techniques, film properties, and some applications are briefly reviewed. Energetic deposition can be defined as a film deposition process in which a significant fraction of particles arrives at the substrate surface with a kinetic energy greater than the bulk displacement energy. Examples of energetic deposition processes include ion-beam-assisted deposition, plasma immersion ion deposition, pulsed laser deposition, and cathodic arc deposition. This work focuses on the production, properties, and use of filtered cathodic arc plasmas. The pulsed biasing technique of metal plasma immersion ion implantation and deposition extends the possibilities of tuning film properties such as density, stress, adhesion, surface roughness, hardness, elastic modulus, and optical constants via the energy of film-forming ions. The difference between kinetic and total ion energy, atomic scale heating, nucleation, intermixing, subplantation, and the relaxation of compressive stress by relatively high-energy ions are discussed.