Abstract
Metal liftoff process has been demonstrated using solvent soluble UV cuable resin by UV nanoimprint lithography. Fine pattern is fabricated by UV nanoimprint using NIAC702 resist (Daisel Chemical), which is solved into Cyclohexanone. After removing residual layer by plasma etching, Cr is deposited by electron beam spattering and the resist is dissolved by Cyclohexanone. Using solvent soluble UV curable resin, Cr pattern is successfully transferred on the substrate by liftoff process.
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