Fabrication of a nano-scale embedded metal electrode in flexible films by UV/thermal nanoimprint lithography tools

Abstract

Nanoimprint lithography (NIL) which is well-known as a type of next-generation lithography, is a promising technology to produce sub-50 nm half-pitch features on several types of substrates. Particularly, ultraviolet (UV) nano-imprint lithography technology has the advantages of a simple process with low pressure of less than room temperature, a low cost, high replication fidelity, and relatively high throughput [1,2]. Recently, many researchers have applied the NIL technique to fabricate metal patterns on a flexible film substrate. Although a flexible film as a substrate has many advantages, most types of flexible polymer film incur weakness caused by the chemicals during the metal lift-off and/or metal etching processes. In this paper, a fabrication method is proposed to create nanoscale metal electrode patterns on a UV-curable polyurethane resist using a UV/thermal nanoimprint lithography processes. A replica fabrication process using the fabricated polyurethane stamp is also proposed. Second- and the third-generation replicas with 30 and 100 nm dot patterns are fabricated using UV and thermal nanoimprint lithography tools.