Abstract
Measurements on nonlinear processes caused by multiphoton absorption and electron avalanche in optical thin films have been carried out using KrF lasers of 20-ns and 1.7-ps pulse duration. Multiphoton absorption of the order of 10-7 J was detected by a photoacoustic signal, and the nonlinear growth of photo-induced current due to the electron avalanche was analyzed dynamically. The correlation between damage threshold and carrier lifetime was investigated for oxide and fluoride coatings.
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