Abstract

ABSTRACTZnSeO alloy was successfully grown by molecular beam epitaxy on GaAs substrate using RF plasma. The crystal structure of epitaxial ZnSeO alloy was zincblende. No phase separation was observed by in-situ reflection high energy electron diffraction and X-ray diffraction measurements. O composition was estimated by lattice constant assuming Vegard's law. Photoluminescence intensity was larger than that of ZnSe. The peak energy shifted toward lower energies by increasing O composition. The band gap energy determined by photoluminescence excitation decreased with increasing O composition. The bowing parameter was obtained as high as 8.2eV. This large band gap bowing widens controllable energy range of II-VI semiconductor.

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