Abstract
Titanium oxide layers were prepared by sputter deposition with plasma emission monitoring in the whole stoichiometry range between Ti and TiO2 without and with substrate heating to 240°C. The layers were characterized with regard to their crystal structure and specific resistance. Optical constants were determined in the spectral range between 240nm and 38μm. The thermochromic behavior of a prepared Ti2O3 layer was measured and compared to calculations for bulk material.
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