Abstract
Boron and Ti/B films have been magnetron sputter deposited and characterized using x-ray diffraction, Auger-depth profiling, and electron microscopy. The amorphous boron films contain no morphological growth features, unlike those characteristically found in thin films prepared by various plasma vapor deposition processes. The use of a high-density boron sputter target prepared by hot isostatic pressing was a major factor in controlling the deposition process. Consequently, the radio frequency sputter deposited boron proves feasible for ultrathin band pass filters as well as the low Z element in high Z/low Z mirrors which enhance reflectivity from grazing to normal incidence.
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