Abstract
We report on the magnetoresistance (MR) properties of [Co(tCo)/Ag 1.5 nm] <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">20</sub> multilayer and alloy films grown with the pulse electrochemical deposition on a polyamide substrate (1 cm <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> ). The induced uniaxial magnetic anisotropy was observed due to the effect of strain in all the multilayer films. The multilayer [Co 1.5 nm/Ag 1.5 nm] <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">20</sub> showed a minimum hysteresis loss. The maximum MR ratio for Co/Ag was 9.2% at 1 kOe. A remarkable difference of magnetic field dependence of the magnetoresistance ratio was observed, corresponding to the orientation of magnetization curves.
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