Abstract
This book was written with the hope that readers especially young researcher or student can study how Argon ion irradiation affects multilayer thin film systems, focus in Fe/Si metal-semiconductor systems and is associated with magnetoresistance (MR) properties. This topic is important because it contains an understanding of the phenomena of physical properties which are very important in relation to MR phenomena on the nanometer scale. The thin films with thicknesses in the nanometer scale are made using the Helicon Sputering technique, a technique that allows the production of films with a very high level of precision. Furthermore, with ion irradiation treatment, it can be seen that there is an effect on the MR properties which can be related to the interfacial structure between Fe and Si layers. Several characterization techniques such as Conversion Electron Mossbauer Spectroscopy (CEMS), Rutherford Back Scattering(RBS) can clarify this effect, including X-ray diffraction(XRD) techniques and confirmation with Vibrating Sample Magnetometer(VSM) and Four Point Probe(FPP) for the magnetic and MR properties of post-irradiated thin film systems. This book can complement our understanding that ion irradiation can changed the physical properties of thin films and the performance of using thin films such as magnetic sensors is reduced in sensitivity. The book is organized into five chapters as follows; in chapter 1 is an introduction about research status of GMR phenomenon in multilayer Fe/Cr and Fe/Si. In chapter 2, we described the basic theory of GMR in multilayer and exchange interaction, also described Helicon plasma Sputtering as synthesis method. Chapter 3, we described about the materials and method of synthesis and characacterization for multilayer film. In Chapter 4, we described in details about pre irradiation and post irradiation of Argon ion related to Fe/Si multilayer and its structure model. In Chapter 5, is the conclusion about ion irradiation effect on structure and magnetic properties of multilayer Fe/Si.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.