Abstract
The paper reports on the magnetoresistance (MR) effect of ferromagnetic Co(tCo)/Cu multilayer films grown with pulse electrochemical deposition on top of a thin conducting layer of copper (15 nm). The copper buffer layer was grown on a polyamide substrate (1.69 cm2) and annealed. A strain was applied mechanically to study the MR effect and magnetic characteristics as a function of the Co layer thickness. The induced uniaxial magnetic anisotropy was observed due to the effect of strain in all the multilayer films. The multilayer [Co 1.0 nm/Cu 1.5 nm]50 showed a minimum hysteresis loss. The MR ratio was ~ 3.4% at 1 kOe. A remarkable difference of magnetoresistance ratio was observed, corresponding to the orientation of magnetization curves.
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