Magnetization reversal driven by spin-transfer-torque in sub-20 nm perpendicular shape anisotropy magnetic tunnel junctions

Abstract

The perpendicular Spin-Transfer-Torque Magnetic Random Access Memory (p-STT-MRAM) is one of the most promising emerging non-volatile memory technologies. As these devices are limited by their thermal stability factor at technological nodes smaller than 20 nm, their downsize capability is compromised. Indeed, as the device shrinks, there is a decrease in thermal stability due to a decrease in the total interfacial perpendicular anisotropy energy proportionally to the cell area. This decrease significantly reduces the retention time of the memory [1-3]. A promising solution to this problem relies on taking advantage of the shape anisotropy of the storage layer by increasing its thickness to values larger than its diameter. The shape anisotropy becomes out-of-plane, with strength proportional to the large volume of the thick cell, bringing an additional robust and tunable source of perpendicular anisotropy on top of the interfacial perpendicular anisotropy. These two sources of anisotropy allow to extend the downsize scalability of STT-MRAM towards sub-20 nm technological nodes [4, 5]. However, the storage layer thickness also affects the writing operation of the cell and should be examined. In this work, the magnetization reversal mechanism of the PSA-STT-MRAM induced by STT was numerically studied. Micromagnetic simulations were carried out (with and without the effect of thermal fluctuations), enabling the identification of different modes of magnetization reversal in this memory. An initial study comprises pillars with aspect-ratios (AR) between 0.8 and 3, with a fixed diameter of 20 nm. It was shown that, for an AR smaller than 1, the mechanism of reversal follows a macrospin-like reversal. When increasing the AR, a non-coherent reversal develops, which evolves from a buckling-like reversal to a transverse-domain wall nucleation-propagation at higher aspect ratios. This latter mode of reversal is associated with the slowing down of the switching dynamics, an effect which worsens as the layer thickness is increased [Fig. 1]. The inverse of the switching time follows a linear relationship with the applied voltage, a law conserved when considering thermal fluctuations. This demonstrates that, even though the nucleation process is assisted by thermal fluctuations, the reversal is controlled by the STT. Changing both the diameter and the thickness but maintaining a thermal stability factor of around 80 it is observed that the minimum voltage to reverse the storage layer increases [Fig. 2]. We interpret as the weakening influence of the strong interfacial STT of tunnelling electrons. This comes along with a transition from a macrospin-like reversal to a buckling-like reversal when AR is increased, despite the thermal stability value is in the same range. This study shows the possibility to obtain a macrospin-like reversal at low applied voltages at sub-20 nm magnetic tunnel junctions. With their switching time of the order of tens of ns, these PSA-STT-MRAM are not fast-enough memories suitable for Cache application but should be functional for dense DRAM type of applications. Also, the junction Resistance x Area product must be lowered compared to conventional STT-MRAM to maintain the write voltage significantly below the barrier breakdown voltage. **