Abstract
Fe-Al-Si-Ni supersendust films containing 2.7 at. % Ni atoms with a thickness of 1 μm were deposited on crystallized-glass substrates by rf planar magnetron sputtering, and the changes in magnetic properties and structure due to the sputtering conditions and annealing were examined. The films with excellent soft magnetic properties and high magnetic-flux density which are good candidates for new recording-head materials were obtained by annealing as-deposited films at 500 °C. It was found through conversion electron Mössbauer spectroscopy (CEMS) that the disordered structure of α type in as-sputtered films transformed into the ordered structure consisting of a mixture of B2 and DO3 types at the temperature of 500 °C. The CEMS studies also revealed that Ni atoms are located at the corner in the bcc structure.
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