Abstract
Fe-Al-Si and Fe-Al-Si-Ni magnetic films with a thickness of 1 mu m were deposited on crystallized-glass substrates by RF planar magnetron sputtering, and the changes in magnetic properties and microscopic structural changes in the films due to annealing were investigated. The films annealed at 500 degrees C exhibited excellent soft magnetic properties for recording head materials. Fe-Al-Si-Ni films with high saturation magnetic-flux densities of 14.8 kG were obtained. Conversion electron Mossbauer spectroscopy showed that the disordered structure of alpha -type in as-sputtered films transformed into the ordered structure consisting of a mixture of B2- and DO/sub 3/-types at a temperature of 500 degrees C. >
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