Abstract
X-ray and transmission electron microscopy structural investigations were performed, as well as determinations of the magnetoresistance and temperature dependence of the resistivity, on r.f. and d.c. sputtered thin nickel films before and after implantation. Phosphorus implantation in the fluence range 10 15–10 16 ions cm −2 was seen to cause several types of structural alterations which strongly influence the magnetic anisotropy.
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