Abstract
In this work we present advanced bulk micromachining using aqueous pure and Triton X-100 [C_<14>H_<22>O(C_2H_4O)_n, n = 9-10] added 25 wt% tetramethylammonium hydroxide (TMAH) solutions in order to extend the range of MEMS structures realized by wet etching. Fabrication processes include two-step wet etching, local oxidation of silicon (LOCOS), and silicon direct wafer bonding. A wide range of advanced fixed and freestanding microelectromechanical systems (MEMS) structures are fabricated. The fixed structures such as rectangular and circular corrugations, square and circular shapes trays, etc. contain perfectly sharp edges and corners. The freestanding structures such as cantilever, microfluidic channels, etc. are fabricated using thermal oxide and single crystal silicon as materials.
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