Abstract
ABSTRACTLow-temperature (LT) growth of InP by gas-source molecular-beam epitaxy has been studied. Contrary to GaAs, InP grown at low temperature (from 200°C to 410°C) shows ntype, low-resistivity properties. The electron concentration changes dramatically with growth temperature. A model of P antisite defects formed during LT growth was used to explain this experimental result. Ex-situ annealing can increase the resistivity, but only by a factor of about 6. Heavily Be-doped LT InP also shows n-type property. We believe this is the first report of an extremely high concentration of donors formed in LT InP and n-type doping by Be in III–V compounds.
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